Capping and gate control of anomalous Hall effect and hump structure in ultra-thin SrRuO films
arXiv:2007.09872 · doi:10.1063/5.0050163
Abstract
Ferromagnetism and exotic topological structures in SrRuO (SRO) induce sign-changing anomalous Hall effect (AHE). Recently, hump structures have been reported in the Hall resistivity of SRO thin films, especially in the ultra-thin regime. We investigate the AHE and hump structure in the Hall resistivity of SRO ultra-thin films with an SrTiO (STO) capping layer and ionic liquid gating. STO capping results in sign changes in the AHE and modulation of the hump structure. In particular, the hump structure in the Hall resistivity is strongly modulated and even vanishes in STO-capped 4 unit cell (uc) films. In addition, the conductivity of STO-capped SRO ultra-thin films is greatly enhanced with restored ferromagnetism. We also performed ionic liquid gating to modulate the electric field at SRO/STO interface. Drastic changes in the AHE and hump structure are observed with different gate voltages. Our study shows that the hump structure as well as the AHE can be controlled by tuning inversion symmetry and the electric field at the interface.
5 pages, 5 figures
References in corpus (7)
- Interface-driven topological Hall effect in SrRuO-SrIrO bilayer
- Electric-field control of anomalous and topological Hall effects in oxide bilayer thin films
- Controllable thickness inhomogeneity and Berry-curvature-engineering of anomalous Hall effect in SrRuO3 ultrathin films
- Two-channel anomalous Hall effect in SrRuO3
- Hump-like structure in Hall signal from SrRuO ultra-thin films without inhomogeneous anomalous Hall effect
- Chemical potential shift and gap-state formation in SrTiO revealed by photoemission spectroscopy
- Orbital-selective confinement effect of Ru orbitals in SrRuO ultrathin film