Wurtzite InP Microdisks: from Epitaxy to Room-Temperature Lasing
arXiv:2004.10677 · doi:10.1088/1361-6528/abbb4e
Abstract
Metastable wurtzite crystal phases of semiconductors comprise enormous potential for high-performance electro-optical devices, owed to their extended tunable direct band gap range. However, synthesizing these materials in good quality and beyond nanowire size constraints has remained elusive. In this work, the epitaxy of wurtzite InP microdisks and related geometries on insulator for optical applications is explored. This is achieved by an elaborate combination of selective area growth of fins and a zipper-induced epitaxial lateral overgrowth, which enables co-integration of diversely shaped crystals at precise position. The grown material possesses high phase purity and excellent optical quality characterized by STEM and -PL. Optically pumped lasing at room temperature is achieved in microdisks with a lasing threshold of 365 , thus demonstrating promise for a wide range of photonic applications.
arXiv comment8 pages, 4 figures
References in corpus (7)
- Attojoule Optoelectronics for Low-Energy Information Processing and Communications: a Tutorial Review
- Unraveling the "Green Gap" problem: The role of random alloy fluctuations in InGaN/GaN light emitting diodes
- Topological Hybrid Silicon Microlasers
- Predicted band structures of III-V semiconductors in wurtzite phase
- Room Temperature InP DFB Laser Array Directly Grown on (001) Silicon
- Selective-area chemical beam epitaxy of in-plane InAs one-dimensional channels grown on InP(001), InP(111)B, and InP(110) surfaces
- Regaining a spatial dimension: Mechanically transferrable two-dimensional InAs nanofins grown by selective area epitaxy