Plasma density and ion energy control via driving frequency and applied voltage in a low pressure capacitively coupled plasma discharge
arXiv:1806.06560 · doi:10.1063/1.5045816
Abstract
The dynamical characteristics of a single frequency low pressure capacitively coupled plasma (CCP) device under varying applied RF voltages and driving frequencies are studied using particle-in-cell/Monte Carlo collision simulations. An operational regime is identified where for a given voltage the plasma density is found to remain constant over a range of driving frequencies and to then increase rapidly as a function of the driving frequency. The threshold frequency for this mode transition as well as the value of the constant density is found to increase with an increase in the applied voltage. Over the constant density range, for a given voltage, the sheath width is seen to increase as a function of the increasing driving frequency, thereby changing the ion energy without affecting the ion density. Our parametric study thus indicates that the twin knobs of the applied voltage and driving frequency offer a means of independently controlling the density and the ion energy in a low pressure CCP device that may be usefully exploited for plasma processing applications.
arXiv comment5 pages, 4 figures
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- Ion energy distribution function in very high frequency capacitive discharges excited by sawtooth waveform
- Flux and energy asymmetry in a low pressure capacitively coupled plasma discharge excited by sawtooth-like waveform -- a harmonic study
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