Controlling the Schottky barrier at MoS2|metal contacts by inserting a BN monolayer
arXiv:1501.02130 · doi:10.1103/PhysRevB.91.161304
Abstract
Making a metal contact to the two-dimensional semiconductor MoS2 without creating a Schottky barrier is a challenge. Using density functional calculations we show that, although the Schottky barrier for electrons obeys the Schottky-Mott rule for high work function ( eV) metals, the Fermi level is pinned at 0.1-0.3 eV below the conduction band edge of MoS2 for low work function metals, due to the metal-MoS2 interaction. Inserting a boron nitride (BN) monolayer between the metal and the MoS2 disrupts this interaction, and restores the MoS2 electronic structure. Moreover, a BN layer decreases the metal work function of Co and Ni by eV, and enables a line-up of the Fermi level with the MoS2 conduction band. Surface modification by adsorbing a single BN layer is a practical method to attain vanishing Schottky barrier heights.
5 pages, 5 figures
References in corpus (7)
- Integrated Circuits Based on Bilayer MoS2 Transistors
- Quasiparticle band structures and optical properties of strained monolayer MoS2 and WS2
- Channel Length Scaling of MoS2 MOSFETs
- Electron-hole transport and photovoltaic effect in gated MoS2 Schottky junctions
- Magnetoresistive junctions based on epitaxial graphene and hexagonal boron nitride
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Cited by in corpus (7)
- Large valley splitting in monolayer WS by proximity coupling to an insulating antiferromagnetic substrate
- Gate-tunable black phosphorus spin valve with nanosecond spin lifetimes
- van der Waals Bonded Co/h-BN Contacts to Ultrathin Black Phosphorus Devices
- Direct Opto-Electronic Imaging of 2D Semiconductor - 3D Metal Buried Interfaces
- Giant proximity exchange and valley splitting in transition metal dichalcogenide//(Co, Ni) heterostructures
- Fermi level depinning via insertion of a graphene buffer layer at the gold-2D tin monoxide contact
- Study of gold and bismuth electrical contacts to a MoS monolayer