Direct bandgap silicon quantum dots achieved via electronegative capping
arXiv:1405.6259 · doi:10.1103/PhysRevB.90.245439
Abstract
We propose a novel concept of achieving silicon quantum dots with radiative rates enhanced by more than two orders of magnitude up to the values characteristic for direct band gap semiconductors. Our tight-binding simulations show how the surface engineering can dramatically change the density of confined electrons in real- and -space and give rise to the new conduction band levels in -valley, thus promoting the direct radiative transitions. The effect may be realized by covering the silicon dots with covalently bonded electronegative ligands, such as alkyl or teflon chains and/or by embedding in highly electronegative medium.
5 pages, 3 figures+ Supplementary Materials
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