Microwave properties of superconducting atomic-layer deposited TiN films

Abstract

We have grown superconducting TiN films by atomic layer deposition with thicknesses ranging from 6 to 89 nm. This deposition method allows us to tune the resistivity and critical temperature by controlling the film thickness. The microwave properties are measured, using a coplanar-waveguide resonator, and we find internal quality factors above a million, high sheet inductances (5.2-620 pH), and pulse response times up to 100 μs. The high normal state resistivity of the films (> 100 μΩcm) affects the superconducting state and thereby the electrodynamic response. The microwave response is modeled using a quasiparticle density of states modified with an effective pair-breaker,consistently describing the measured temperature dependence of the quality factor and the resonant frequency.

arXiv commentThis manuscript is submitted to ASC 2012 Special Issue

References in corpus (6)

• Coherent quantum phase slip
• An analysis method for asymmetric resonator transmission applied to superconducting devices
• Titanium Nitride Films for Ultrasensitive Microresonator Detectors
• Number fluctuations of sparse quasiparticles in a superconductor
• Strongly disordered TiN and NbTiN s-wave superconductors probed by microwave electrodynamics
• Quasiparticle relaxation in optically excited high-Q superconducting resonators

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