Analytical modeling and 3D finite element simulation of line edge roughness in scatterometry
arXiv:1208.4220 · doi:10.1364/AO.51.006457
Abstract
The influence of edge roughness in angle resolved scatterometry at periodically structured surfaces is investigated. A good description of the radiation interaction with structured surfaces is crucial for the understanding of optical imaging processes like, e.g. in photolithography. We compared an analytical 2D model and a numerical 3D simulation with respect to the characterization of 2D diffraction of a line grating involving structure roughness. The results show a remarkably high agreement. The diffraction intensities of a rough structure can therefore be estimated using the numerical simulation result of an undisturbed structure and an analytically derived correction function. This work allows to improve scatterometric results for the case of practically relevant 2D structures.
References in corpus (5)
- Adaptive Finite Element Method for Simulation of Optical Nano Structures
- Domain Decomposition Method for Maxwell's Equations: Scattering off Periodic Structures
- Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis
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Cited by in corpus (5)
- Reconstructing Detailed Line Profiles of Lamellar Gratings from GISAXS Patterns with a Maxwell Solver
- Correlated Diffuse X-ray Scattering from Periodically Nano-Structured Surfaces
- Applicability of the Debye-Waller damping factor for the determination of the line-edge roughness of lamellar gratings
- hp-finite element method for simulating light scattering from complex 3D structures
- Characteristic diffuse scattering from distinct line roughnesses