Atomically flat interface between a single-terminated LaAlO3 substrate and SrTiO3 thin film is insulating
arXiv:1205.1305 · doi:10.1063/1.3688772
Abstract
The surface termination of (100)-oriented LaAlO3 (LAO) single crystals was examined by atomic force microscopy and optimized to produce a single-terminated atomically flat surface by annealing. Then the atomically flat STO film was achieved on a single-terminated LAO substrate, which is expected to be similar to the n-type interface of two-dimensional electron gas (2DEG), i.e., (LaO)-(TiO2). Particularly, that can serve as a mirror structure for the typical 2DEG heterostructure to further clarify the origin of 2DEG. This newly developed interface was determined to be highly insulating. Additionally, this study demonstrates an approach to achieve atomically flat film growth based on LAO substrates.
4 pages, 3 figures
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Cited by in corpus (7)
- Physics of SrTiO-based heterostructures and nanostructures: a review
- Origin of the two-dimensional electron gas at LaAlO3/SrTiO3 interfaces: The role of oxygen vacancies and electronic reconstruction
- Atomically flat single terminated oxide substrate surfaces
- Bandgap Controlling of the Oxygen-Vacancy-Induced Two-Dimensional Electron Gas in SrTiO3
- Role of polar compensation in interfacial ferromagnetism of LaNiO/CaMnO superlattices
- The Conducting Channel at the LaAlO/SrTiO Interface
- Metal-Insulator Transition in -type bulk crystals and films of strongly compensated SrTiO