Energetics and stability of dangling-bond silicon wires on H passivated Si(100)
arXiv:1203.2548 · doi:10.1088/0953-8984/24/44/445004
Abstract
We evaluate the electronic, geometric and energetic properties of quasi 1-D wires formed by dangling bonds on Si(100)-H (2 x 1). The calculations are performed with density functional theory (DFT). Infinite wires are found to be insulating and Peierls distorted, however finite wires develop localized electronic states that can be of great use for molecular-based devices. The ground state solution of finite wires does not correspond to a geometrical distortion but rather to an antiferromagnetic ordering. For the stability of wires, the presence of abundant H atoms in nearby Si atoms can be a problem. We have evaluated the energy barriers for intradimer and intrarow diffusion finding all of them about 1 eV or larger, even in the case where a H impurity is already sitting on the wire. These results are encouraging for using dangling-bond wires in future devices.
arXiv comment8 pages, 6 figures
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Cited by in corpus (6)
- Single Electron Dynamics of an Atomic Silicon Quantum Dot on the H-Si(100) 2x1 Surface
- Optimizing surface defects for atomic-scale electronics: Si dangling bonds
- Elastic transport through dangling-bond silicon wires on H passivated Si(100)
- Search for a Metallic Dangling-Bond Wire on -doped H-passivated Semiconductor Surfaces
- Spin transport in dangling-bond wires on doped H-passivated Si(100)
- Antiferromagnetic ordering of dangling-bond electrons at the stepped Si(001) surface