Approximate Theory of Temperature Coefficient of Resistivity of Amorphous Semiconductors
arXiv:1112.4723 · doi:10.1103/PhysRevB.85.125135
Abstract
In this paper, we develop an approximate theory of the temperature coefficient of resistivity (TCR) and conductivity based upon the recently proposed Microscopic Response Method. By introducing suitable approximations for the lattice dynamics, localized and extended electronic states, we produce new explicit forms for the conductivity and TCR, which depend on easily accessible material parameters. The theory is in reasonable agreement with experiments on a-Si:H and a-Ge:H. A long-standing puzzle, a \textquotedblleft kink\textquotedblright\ in the experimental vs. 1/T curve, is predicted by the theory and attributed to localized to extended transitions, which have not been properly handled in earlier theories.
14pages 7 figures, submitted to Phys. Rev. B
References in corpus (8)
- Atomistic Origin of Urbach Tails in Amorphous Silicon
- Structure determination of disordered materials from diffraction data
- Topological and topological-electronic correlations in amorphous silicon
- Hidden structure in amorphous solids
- Phonon driven transport in amorphous semiconductors: Transition probabilities
- Alternative approach to computing transport coefficients: application to conductivity and Hall coefficient of hydrogenated amorphous silicon
- A semi-quantitative scattering theory of amorphous materials
- The Microscopic Response Method: theory of transport for systems with both topological and thermal disorder