Anomalous diffusion mediated by atom deposition into a porous substrate
arXiv:0902.2618 · doi:10.1103/PhysRevLett.102.045901
Abstract
Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time
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