149 citations · 210 across the 6 of their papers we have counts for
6 papers
The role of sputtered atom and ion energy distribution in films deposited by Physical Vapor Deposition: A molecular dynamics approach
Soumya Atmane, Maroussiak Alexandre, Amaël Caillard +4
We present a comparative study of copper film growth with a constant energy neutral beam, thermal evaporation, dc magnetron sputtering, high-power impulse magnetron sputtering (HiP…
Influence of Defects on Barrier Energy Formation for OOH* Intermediate in ORR on Tetragonal-ZrO 2 with Adsorbed-Hydroxyl
Seyedehsara Fazeli, Pascal Brault, Amaël Caillard +4
Accelerating the oxygen reduction reaction (ORR) is a main subject of electrocatalysis research.A critical step of ORR is the formation of the hydroperoxyl functional group (OOH*)…
On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulation
Movaffaq Kateb, Jon Tomas Gudmundsson, Pascal Brault +2
We study the effect of the so-called ion potential or non-kinetic energies of bombarding ions during ionized physical vapor deposition of Cu using molecular dynamics simulations. I…
Molecular Dynamics for Low Temperature Plasma-Surface Interaction Studies
David B. Graves, Pascal Brault
The mechanisms of physical and chemical interactions of low temperature plasmas with surfaces can be fruitfully explored using molecular dynamics (MD) simulations. MD simulations f…
Anomalous diffusion mediated by atom deposition into a porous substrate
Pascal Brault, Christophe Josserand, Jean-Marc Bauchire +3
Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic contr…
Shadowing effects for continuum and discrete deposition models
Thu Huong Vo Thi, Pascal Brault, Jean-Louis Rouet +1
We study the dynamical evolution of the deposition interface using both discrete and continuous models for which shadowing effects are important. We explain why continuous and disc…