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A. Caillard

3 papers hereh-index 231.4k citations173 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author3

Across the 3 of 3 papers where every author was matched, so the position is known.

fields
  • physics.comp-ph2
  • cond-mat.stat-mech1

identity via Semantic Scholar / OpenAlex

most citedAnomalous diffusion mediated by atom deposition into a porous substrate

49 citations · 49 across the 3 of their papers we have counts for

collaborators

3 papers

physics.comp-ph2024

The role of sputtered atom and ion energy distribution in films deposited by Physical Vapor Deposition: A molecular dynamics approach

Soumya Atmane, Maroussiak Alexandre, Amaël Caillard +4

We present a comparative study of copper film growth with a constant energy neutral beam, thermal evaporation, dc magnetron sputtering, high-power impulse magnetron sputtering (HiP…

physics.comp-ph2024

Influence of Defects on Barrier Energy Formation for OOH* Intermediate in ORR on Tetragonal-ZrO 2 with Adsorbed-Hydroxyl

Seyedehsara Fazeli, Pascal Brault, Amaël Caillard +4

Accelerating the oxygen reduction reaction (ORR) is a main subject of electrocatalysis research.A critical step of ORR is the formation of the hydroperoxyl functional group (OOH*)…

cond-mat.stat-mech2009★ 49 cited

Anomalous diffusion mediated by atom deposition into a porous substrate

Pascal Brault, Christophe Josserand, Jean-Marc Bauchire +3

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic contr…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.