Digital resonance tuning of high-Q/Vm silicon photonic crystal nanocavities by atomic layer deposition

Abstract

We propose and demonstrate the digital resonance tuning of high-Q/Vm silicon photonic crystal nanocavities using a self-limiting atomic layer deposition technique. Control of resonances in discrete steps of 122 +/- 18 pm per hafnium oxide atomic layer is achieved through this post-fabrication process, nearly linear over a full 17 nm tuning range. The cavity Q is maintained in this perturbative process, and can reach up to its initial values of 49,000 or more. Our results are highly controllable, applicable to many material systems, and particularly critical to matching resonances and transitions involving mesoscopic optical cavities.

arXiv comment9 pages, 3 figures

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Cited by in corpus (7)

• Integrated quantum photonics with silicon carbide: challenges and prospects
• Selective tuning of high-Q silicon photonic crystal nanocavities via laser-assisted local oxidation
• Radio frequency regenerative oscillations in monolithic high-Q/V heterostructured photonic crystal cavities
• Observations of temporal group delays in slow-light multiple coupled photonic crystal cavities
• Deterministic integrated tuning of multi-cavity resonances and phase for slow-light in coupled photonic crystal cavities
• Optomechanical cooling with coherent and squeezed light: the thermodynamic cost of opening the heat valve
• Deterministic tuning of slow-light in photonic-crystal waveguides through the C and L bands by atomic layer deposition