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Carl Zeiss (United States)

United States

1 paper here294 citations across 1
fields
  • cond-mat.mes-hall1
ROR 01xk5xs43OpenAlex

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most citedEtching of Graphene Devices with a Helium Ion Beam

294 citations

collaborating institutions
  • Harvard UniversityUS1 paper
  • Massachusetts Institute of TechnologyUS1 paper
  • NanoScale Corporation (United States)US1 paper

1 paper

cond-mat.mes-hall2009★ 294 cited

Etching of Graphene Devices with a Helium Ion Beam

M. C. Lemme, D. C. Bell, J. R. Williams +4

We report on the etching of graphene devices with a helium ion beam, including in situ electrical measurement during lithography. The etching process can be used to nanostructure a…

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