365 citations · 659 across the 2 of their papers we have counts for
2 papers
cond-mat.mes-hall2009★ 294 cited
Etching of Graphene Devices with a Helium Ion Beam
M. C. Lemme, D. C. Bell, J. R. Williams +4
We report on the etching of graphene devices with a helium ion beam, including in situ electrical measurement during lithography. The etching process can be used to nanostructure a…
cond-mat.mes-hall2009★ 365 cited
Precision Cutting and Patterning of Graphene with Helium Ions
D. C. Bell, M. C. Lemme, L. A. Stern +2
We report nanoscale patterning of graphene using a helium ion microscope configured for lithography. Helium ion lithography is a direct-write lithography process, comparable to con…