most citedSpatially resolved stress measurements in materials with polarization-sensitive optical coherence tomography: image acquisition and processing aspects

16 citations

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2 papers

physics.app-ph2017

Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography

Roberto Fallica, Dimitrios Kazazis, Robert Kirchner +4

Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist materi…

physics.optics2011★ 16 cited

Spatially resolved stress measurements in materials with polarization-sensitive optical coherence tomography: image acquisition and processing aspects

Bettina Heise, Karin Wiesauer, Erich Götzinger +6

We demonstrate that polarization-sensitive optical coherence tomography (PS-OCT) is suitable to map the stress distribution within materials in a contactless and non-destructive wa…