33 citations · 66 across the 7 of their papers we have counts for
7 papers
Holographic EUV Lithography at 40 nm Resolution
Ziqi Li, Iason Giannopoulos, Lisong Dong +7
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflectiv…
Extreme ultraviolet lithography reaches 5 nm resolution
Iason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber +2
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development…
Deep learning denoiser assisted roughness measurements extraction from thin resists with low Signal-to-Noise Ratio(SNR) SEM images: analysis with SMILE
Sara Sacchi, Bappaditya Dey, Iacopo Mochi +2
The technological advance of High Numerical Aperture Extreme Ultraviolet Lithography (High NA EUVL) has opened the gates to extensive researches on thinner photoresists (below 30nm…
Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
Roberto Fallica, Dimitrios Kazazis, Robert Kirchner +4
Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist materi…
GIANO-TNG spectroscopy of red supergiants in the young star cluster RSGC2
L. Origlia, E. Oliva, R. Maiolino +19
The inner disk of the Galaxy has a number of young star clusters dominated by red supergiants that are heavily obscured by dust extinction and observable only at infrared wavelengt…
A GIANO-TNG high resolution IR spectrum of the airglow emission
E. Oliva, L. Origlia, R. Maiolino +19
A flux-calibrated high resolution spectrum of the airglow emission is a practical lambda-calibration reference for astronomical spectral observations. It is also useful for constra…
Bessel beam propagation: Energy localization and velocity
D. Mugnai, I. Mochi
The propagation of a Bessel beam (or Bessel-X wave) is analyzed on the basis of a vectorial treatment. The electric and magnetic fields are obtained by considering a realistic situ…