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physics.optics2026
Holographic EUV Lithography at 40 nm Resolution
Ziqi Li, Iason Giannopoulos, Lisong Dong +7
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflectiv…
physics.optics2024★ 1 cited
Extreme ultraviolet lithography reaches 5 nm resolution
Iason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber +2
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development…
physics.optics2005
Bessel beam propagation: Energy localization and velocity
D. Mugnai, I. Mochi
The propagation of a Bessel beam (or Bessel-X wave) is analyzed on the basis of a vectorial treatment. The electric and magnetic fields are obtained by considering a realistic situ…