30 citations
10 papers
Discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma with an axisymmetric magnetic field
Swati Dahiya, Pawandeep Singh, Yashashri Patil +3
We investigate the discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma discharge with an axisymmetric magnetic field genera…
Flux and energy asymmetry in a low pressure capacitively coupled plasma discharge excited by sawtooth-like waveform -- a harmonic study
Sarveshwar Sharma, Nishant Sirse, Miles M Turner
Control over plasma asymmetry in a low-pressure capacitively coupled plasma (CCP) discharges is vital for many plasma processing applications. In this article, using the particle-i…
Plasma asymmetry, electron and ion energy distribution function in capacitive discharges excited by tailored waveforms
Sarveshwar Sharma, Nishant Sirse, Animesh Kuley +1
Using particle-in-cell simulation technique, we investigate the plasma and ionization asymmetry, electron and ion energy distribution function in capacitive discharges excited by t…
Ion energy distribution function in very high frequency capacitive discharges excited by sawtooth waveform
Sarveshwar Sharma, Nishant Sirse, Animesh Kuley +1
Tailoring ion energy distribution function (IEDF) is vital for advanced plasma processing applications. Capacitively coupled plasma (CCP) discharges excited using non-sinusoidal wa…
High frequency sheath modulation and higher harmonic generation in a low pressure very high frequency capacitively coupled plasma excited by sawtooth waveform
Sarveshwar Sharma, Nishant Sirse, Miles M Turner
A particle-in-cell (PIC) simulation study is performed to investigate the discharge asymmetry, higher harmonic generations and electron heating mechanism in a low pressure very hig…
Driving frequency effect on discharge parameters and higher harmonic generation in capacitive discharges at constant power densities
Sarveshwar Sharma, Nishant Sirse, Animesh Kuley +2
Very high frequency (VHF) driven capacitive discharges are now being increasingly adopted for plasma-based materials processing due to their high processing rates and lower substra…