output
19972026
most citedThe Photodetector Array Camera and Spectrometer (PACS) on the Herschel Space Observatory

2.2k citations

Showing cond-mat.mtrl-sciShow all

88 papers · 1 filter

cond-mat.mtrl-sci2026

Band Tail State Broadening in IGZO TFTs After pBTI-Induced Negative VT Shift Revealed via DC and 1/f Noise Measurements

R. Asanovski, P. Rinaudo, A. Chasin +9

We investigate the origin of negative threshold voltage shifts in back-gated amorphous IGZO TFTs under positive bias and high temperature stress. Combined DC and 1/f noise measurem…

cond-mat.mtrl-sci2026★ 1 cited

Engineering Magnetic Anisotropy in Permalloy Films via Atomic Force Nanolithography

Abhishek Naik, Cyril Delforge, Nicolas Lejeune +5

Atomic force nanolithography provides a precise method for sculpting magnetic thin films, enabling controlled engineering of magnetic anisotropy in soft ferromagnets at the microsc…

cond-mat.mtrl-sci2025

Sub-unit cell engineering of CrVO superlattice thin films

Claudio Bellani, Simon Mellaerts, Wei-Fan Hsu +13

Ordered corundum oxides introduce new prospects in the field of functional oxides thin films, complementing the more widely studied class of ABO perovskites. In this work, we t…

cond-mat.mtrl-sci2025★ 10 cited

Subthreshold Swing Behavior in Amorphous Indium-Gallium-Zinc-Oxide Transistors from Room to Cryogenic Temperatures

Hongwei Tang, Attilio Belmonte, Dennis Lin +10

While cryogenic-temperature subthreshold swing (SS) in crystalline semiconductors has been widely studied, a careful study on the temperature-dependent SS in amorphous oxide semico…

cond-mat.mtrl-sci2025★ 4 cited

Impact of Mechanical Stress on IGZO TFTs: Enhancing PBTI Degradation

K. Vishwakarma, K. Lee, A. Kruv +8

This study investigates the impact of out-of-plane compressive mechanical stress (MS) on the performance and reliability of n-channel IGZO thin film transistors (TFTs). It is demon…

cond-mat.mtrl-sci2025★ 3 cited

Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists

Kevin M. Dorney, Ivan Pollentier, Fabian Holzmeier +11

Metal oxide resists (MORs) have shown great promise for high resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high volume manufac…