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cs.AR2014★ 5 cited
A High-Performance Triple Patterning Layout Decomposer with Balanced Density
Bei Yu, Yen-Hung Lin, Gerard Luk-Pat +3
Triple patterning lithography (TPL) has received more and more attentions from industry as one of the leading candidate for 14nm/11nm nodes. In this paper, we propose a high perfor…
cs.AR2007
Bright-Field AAPSM Conflict Detection and Correction
C. Chiang, A. Kahng, S. Sinha +2
As feature sizes shrink, it will be necessary to use AAPSM (Alternating-Aperture Phase Shift Masking) to image critical features, especially on the polysilicon layer. This imposes…