93 citations · 379 across the 19 of their papers we have counts for
19 papers
Open-Source Differentiable Lithography Imaging Framework
Guojin Chen, Hao Geng, Bei Yu +1
The rapid evolution of the electronics industry, driven by Moore's law and the proliferation of integrated circuits, has led to significant advancements in modern society, includin…
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition
Guojin Chen, Haoyu Yang, Bei Yu
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of…
E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System
Bei Yu, Kun Yuan, Jhih-Rong Gao +1
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character p…
Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session)
Bei Yu, Subhendu Roy, Jhih-Rong Gao +1
Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. Conventional LELELE type TPL technology suffers from native conflict…
Layout Decomposition for Quadruple Patterning Lithography and Beyond
Bei Yu, David Z. Pan
For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patt…
Lithography Hotspot Detection and Mitigation in Nanometer VLSI
Jhih-Rong Gao, Bei Yu, David Z. Pan
With continued feature size scaling, even state of the art semiconductor manufacturing processes will often run into layouts with poor printability and yield. Identifying lithograp…