Fraunhofer Institute for Electronic Nano Systems

output

20162026

most citedElectronic transport in metallic carbon nanotubes with mixed defects within the strong localization regime

18 citations

researchers with a paper here

Counting papers with at most 25 authors, so collaboration author lists do not stand in for the people here.

J. Schuster13 · h 22
Fabian Teichert2 profiles8 · h 5
A. Zienert7 · h 10
C. Wagner6 · h 30
M. Schreiber5 · h 39
Jörg Schuster3 profiles4 · h 2
A. Forster3 · h 2
Christian Wagner3 profiles3 · h 7
T. Gessner3 · h 32
D. Reuter2 profiles2 · h 10
Florian Fuchs2 · h 9
S. Gemming2 · h 30

collaborating institutions

Chemnitz University of TechnologyDE20 papers
Technische Universität DresdenDE10 papers
Dresden Center for Computational Materials ScienceDE8 papers
Helmholtz-Zentrum Dresden-RossendorfDE5 papers
Center for Advancing Electronics DresdenDE2 papers
Bar-Ilan UniversityIL1 paper
Ca' Foscari University of VeniceIT1 paper
Center for Molecular BioengineeringDE1 paper
DVGW-Forschungsstelle am Engler-Bunte-Institut des Karlsruher Instituts für TechnologieDE1 paper
Fraunhofer-GesellschaftDE1 paper
Karlsruhe Institute of TechnologyDE1 paper
Linnaeus UniversitySE1 paper

Showing 2017 · physics.chem-phShow all

1 paper · 2 filters

physics.chem-ph2017★ 2 cited

Theoretical investigation of in situ k-restore processes for damaged ultra-low-k dielectrics

A. Förster, C. Wagner, J. Schuster +1

Ultra-low-k (ULK) materials are essential for today's production of integrated circuits (ICs). However, during the manufacturing process the ULK's low dielectric constant (k-value)…