783 citations
- Deutsches Elektronen-Synchrotron DESYDE11 papers
- EdgeWave (Germany)DE11 papers
- University of EdinburghGB11 papers
- University of LiverpoolGB11 papers
- University of RegensburgDE11 papers
- John von Neumann Institute for ComputingDE8 papers
- Technical University of MunichDE4 papers
- Technische Universität BerlinDE3 papers
- Advanced Mask Technology Center (Germany)DE2 papers
- Freie Universität BerlinDE2 papers
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- Physikalisch-Technische BundesanstaltDE2 papers
Showing 2006 · physics.opticsShow all
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physics.optics2006★ 6 cited
Rigorous FEM-Simulation of EUV-Masks: Influence of Shape and Material Parameters
J. Pomplun, S. Burger, F. Schmidt +4
We present rigorous simulations of EUV masks with technological imperfections like side-wall angles and corner roundings. We perform an optimization of two different geometrical pa…
physics.optics2006★ 13 cited
Rigorous Simulation of 3D Masks
S. Burger, R. Köhle, L. Zschiedrich +4
We perform 3D lithography simulations by using a finite-element solver. To proof applicability to real 3D problems we investigate DUV light propagation through a structure of size…