783 citations
- Deutsches Elektronen-Synchrotron DESYDE10 papers
- University of EdinburghGB10 papers
- University of LiverpoolGB10 papers
- University of RegensburgDE10 papers
- John von Neumann Institute for ComputingDE8 papers
- EdgeWave (Germany)DE6 papers
- Technical University of MunichDE4 papers
- Freie Universität BerlinDE2 papers
- Leipzig UniversityDE2 papers
- Technische Universität BerlinDE2 papers
- Advanced Mask Technology Center (Germany)DE1 paper
- Ames National LaboratoryUS1 paper
6 papers · 1 filter
Benchmark of Rigorous Methods for Electromagnetic Field Simulations
S. Burger, L. Zschiedrich, F. Schmidt +2
We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulat…
Finite Element Simulation of Light Propagation in Non-Periodic Mask Patterns
L. Zschiedrich, F. Schmidt
Rigorous electromagnetic field simulations are an essential part for scatterometry and mask pattern design. Today mainly periodic structures are considered in simulations. Non-peri…
FEM investigation of leaky modes in hollow core photonic crystal fibers
J. Pomplun, R. Holzlöhner, S. Burger +2
Hollow-core holey fibers are promising candidates for low-loss guidance of light in various applications, e.g., for the use in laser guide star adaptive optics systems in optical a…
Goal Oriented Adaptive Finite Element Method for the Precise Simulation of Optical Components
L. Zschiedrich, S. Burger, J. Pomplun +1
Adaptive finite elements are the method of choice for accurate simulations of optical components. However as shown recently by Bienstman et al. many finite element mode solvers fai…
Rigorous FEM-Simulation of EUV-Masks: Influence of Shape and Material Parameters
J. Pomplun, S. Burger, F. Schmidt +4
We present rigorous simulations of EUV masks with technological imperfections like side-wall angles and corner roundings. We perform an optimization of two different geometrical pa…
Rigorous Simulation of 3D Masks
S. Burger, R. Köhle, L. Zschiedrich +4
We perform 3D lithography simulations by using a finite-element solver. To proof applicability to real 3D problems we investigate DUV light propagation through a structure of size…