149 citations
Counting papers with at most 25 authors, so collaboration author lists do not stand in for the people here.
- Vrije Universiteit AmsterdamNL27 papers
- University of GroningenNL13 papers
- University of AmsterdamNL7 papers
- Zernike Institute for Advanced MaterialsNL7 papers
- University of TwenteNL6 papers
- ASML (Netherlands)NL5 papers
- Centre National de la Recherche ScientifiqueFR3 papers
- Institute for Atomic and Molecular PhysicsNL3 papers
- Institute of SpectroscopyRU3 papers
- Russian Academy of SciencesRU3 papers
- Delta Institute for Theoretical PhysicsNL2 papers
- Eindhoven University of TechnologyNL2 papers
6 papers · 1 filter
Active Two-dimensional Steering of Radiation from a Nano-Aperture
Laura S. Dreissen, Hugo F. Schouten, Wim Ubachs +2
We experimentally demonstrate control over the direction of radiation of a beam that passes through a square nano-aperture in a metal film. The ratio of the aperture size and the w…
Energy Level Structure of Sn Ions
J. Scheers, A. Ryabtsev, A. Borschevsky +10
Laser-produced Sn plasma sources are used to generate extreme ultraviolet (EUV) light in state-of-the-art nanolithography. An ultraviolet and optical spectrum is measured from a dr…
Expansion Dynamics After Laser-Induced Cavitation in Liquid Tin Microdroplets
Dmitry Kurilovich, Tiago de Faria Pinto, Francesco Torretti +9
The cavitation-driven expansion dynamics of liquid tin microdroplets is investigated, set in motion by the ablative impact of a 15-ps laser pulse. We combine high-resolution strobo…
Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light
Sten A. Reijers, Dmitry Kurilovich, Francesco Torretti +2
We present and experimentally validate a model describing the sensitivity of the tilt angle, expansion and propulsion velocity of a tin micro-droplet irradiated by a 1 μm Nd:YAG la…
Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair
Aneta S. Stodolna, Tiago de Faria Pinto, Faisal Ali +7
The next generation of lithography machines uses extreme ultraviolet (EUV) light originating from laser-produced plasma (LPP) sources, where a small tin droplet is ionized by an in…
Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging
G. S. M. Jansen, A. C. C. de Beurs, X. Liu +2
We demonstrate a novel imaging approach and associated reconstruction algorithm for far-field coherent diffractive imaging, based on the measurement of a pair of laterally sheared…