57 citations
- Institute of SpectroscopyRU5 papers
- Advanced Research Center for Nanolithography (Netherlands)NL2 papers
- Max Planck Institute for Nuclear PhysicsDE2 papers
- Moscow Institute of Physics and TechnologyRU2 papers
- Russian Academy of SciencesRU2 papers
- University of GroningenNL2 papers
- Vrije Universiteit AmsterdamNL2 papers
- Zernike Institute for Advanced MaterialsNL2 papers
- All Russia Research Institute of AutomaticsRU1 paper
- Joint Institute for High TemperaturesRU1 paper
- Landau Institute for Theoretical PhysicsRU1 paper
- Tel Aviv UniversityIL1 paper
5 papers
Expansion and fragmentation of liquid metal droplet by a short laser pulse
S. Yu. Grigoryev, B. V. Lakatosh, M. S. Krivokorytov +11
We report an experimental and numerical investigation of the fragmentation mechanisms of micrometer-sized metal droplet irradiated by ultrashort laser pulses. The results of the ex…
Optical spectroscopy of complex open 4-shell ions Sn-Sn
F. Torretti, A. Windberger, A. Ryabtsev +8
We analyze the complex level structure of ions with many-valence-electron open [Kr] 4 sub-shells (=7-4) with ab initio calculations based on configuration…
Analysis of the fine structure of Sn ions by optical spectroscopy in an electron beam ion trap
A. Windberger, F. Torretti, A. Borschevsky +9
We experimentally re-evaluate the fine structure of Sn ions. These ions are essential in bright extreme-ultraviolet (EUV) plasma-light sources for next-generation nan…
Droplet deformation and fragmentation by ultra-short laser pulses
M. S. Krivokorytov, A. Yu. Vinokhodov, Yu. V. Sidelnikov +5
We report on the experimental studies of the deformation and fragmentation of liquid metal droplets by picosecond and subpicosecond laser pulses. The experiments were performed wit…
Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes
A Dolgov, O Yakushev, A Abrikosov +4
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma…