47 citations · 129 across the 6 of their papers we have counts for
6 papers
Miniature Plasma Source for In-Situ Scanner Cleaning
Mark van de Kerkhof, Edgar Osorio, Vladimir Krivtsun +3
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces…
Expansion and fragmentation of liquid metal droplet by a short laser pulse
S. Yu. Grigoryev, B. V. Lakatosh, M. S. Krivokorytov +11
We report an experimental and numerical investigation of the fragmentation mechanisms of micrometer-sized metal droplet irradiated by ultrashort laser pulses. The results of the ex…
Droplet deformation and fragmentation by ultra-short laser pulses
M. S. Krivokorytov, A. Yu. Vinokhodov, Yu. V. Sidelnikov +5
We report on the experimental studies of the deformation and fragmentation of liquid metal droplets by picosecond and subpicosecond laser pulses. The experiments were performed wit…
Plasma probe characteristics in low density hydrogen pulsed plasmas
D. I. Astakhov, W. J. Goedheer, C. J. Lee +6
Probe theories are only applicable in the regime where the probe's perturbation of the plasma can be neglected. However, it is not always possible to know, a priori, that a particu…
Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes
A Dolgov, O Yakushev, A Abrikosov +4
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma…
Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas
A Dolgov, D Lopaev, T Rachimova +6
Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal…