106 citations
- Eindhoven University of TechnologyNL18 papers
- University of TwenteNL12 papers
- Centre National de la Recherche ScientifiqueFR6 papers
- University of AmsterdamNL6 papers
- Advanced Research Center for Nanolithography (Netherlands)NL5 papers
- Radboud University NijmegenNL5 papers
- Delft University of TechnologyNL4 papers
- Institute of SpectroscopyRU4 papers
- University of GroningenNL4 papers
- Commissariat à l'Énergie Atomique et aux Énergies AlternativesFR3 papers
- Commonwealth Scientific and Industrial Research OrganisationAU3 papers
- Helmholtz Institute MainzDE3 papers
5 papers · 1 filter
Particle lofting from substrate exposed to plasma and electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from…
Addendum to `Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy'
Bart Platier, Ferdi van de Wetering, Mark van Ninhuijs +4
A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV pho…
Plasma Propulsion of a Metallic Micro-droplet and its Deformation upon Laser Impact
Dmitry Kurilovich, Alexander L. Klein, Francesco Torretti +5
The propulsion of a liquid indium-tin micro-droplet by nanosecond-pulse laser impact is experimentally investigated. We capture the physics of the droplet propulsion in a scaling l…
Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen
D. I. Astakhov, W. J. Goedheer, C. J. Lee +8
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by micro…
Exploring the electron density in plasmas induced by extreme ultraviolet radiation in argon
R. M. van der Horst, J. Beckers, E. A. Osorio +1
The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impac…