438 citations
- Weizmann Institute of ScienceIL7 papers
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Showing 2010 · physics.opticsShow all
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physics.optics2010★ 14 cited
Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis
J. Pomplun, S. Burger, F. Schmidt +3
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) n…
physics.optics2010★ 145 cited
Tuning the Thermal Expansion Properties of Optical Reference Cavities with Fused Silica Mirrors
Thomas Legero, Thomas Kessler, Uwe Sterr
We investigate the thermal expansion of low thermal noise Fabry-Perot cavities made of Low Thermal Expansion (LTE) glass spacers and Fused Silica (FS) mirrors. The different therma…