438 citations
- Weizmann Institute of ScienceIL7 papers
- Leibniz University HannoverDE6 papers
- University of LatviaLV5 papers
- Bielefeld UniversityDE4 papers
- Max Planck Institute for the Physics of Complex SystemsDE4 papers
- Karlsruhe Institute of TechnologyDE3 papers
- National Physical LaboratoryGB3 papers
- Point UniversityUS3 papers
- RWTH Aachen UniversityDE3 papers
- Technische Universität DresdenDE3 papers
- University of Beira InteriorPT3 papers
- University of CoimbraPT3 papers
4 papers · 1 filter
Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis
J. Pomplun, S. Burger, F. Schmidt +3
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) n…
Tuning the Thermal Expansion Properties of Optical Reference Cavities with Fused Silica Mirrors
Thomas Legero, Thomas Kessler, Uwe Sterr
We investigate the thermal expansion of low thermal noise Fabry-Perot cavities made of Low Thermal Expansion (LTE) glass spacers and Fused Silica (FS) mirrors. The different therma…
Optical frequency synthesis and measurement using fibre-based femtosecond lasers
Gesine Grosche, Burghard Lipphardt, Harald Schnatz
We report the synthesis and measurement of an ultra-precise and extremely stable optical frequency in the telecommunications window around 1543 nm. Using a fibre-based femtosecond…
Rigorous FEM-Simulation of EUV-Masks: Influence of Shape and Material Parameters
J. Pomplun, S. Burger, F. Schmidt +4
We present rigorous simulations of EUV masks with technological imperfections like side-wall angles and corner roundings. We perform an optimization of two different geometrical pa…