most citedReduced basis method for source mask optimization

8 citations

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1 paper

physics.optics2010★ 8 cited

Reduced basis method for source mask optimization

J. Pomplun, L. Zschiedrich, S. Burger +4

Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has beco…