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P. Mishra

3 papers hereh-index 283.1k citations115 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author3

Across the 3 of 3 papers where every author was matched, so the position is known.

fields
  • cond-mat.mtrl-sci2
  • physics.optics1
same name
  • P. Mishra — 23 papers, h 20
  • P. Mishra — 14 papers, h 42
  • P. Mishra — 13 papers, h 4
  • P. Mishra — 9 papers, h 28
  • P. Mishra — 8 papers, h 3
  • P. Mishra — 6 papers, h 5

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

most citedA hidden advantage of van der Waals materials for overcoming limitations in photonic integrated circuitry

1 citations · 1 across the 2 of their papers we have counts for

collaborators

3 papers

physics.optics2023★ 1 cited

A hidden advantage of van der Waals materials for overcoming limitations in photonic integrated circuitry

Andrey A. Vyshnevyy, Georgy A. Ermolaev, Dmitriy V. Grudinin +11

With the advance of on-chip nanophotonics, there is a high demand for high refractive index, low-loss materials. Currently, this technology is dominated by silicon, but van der Waa…

cond-mat.mtrl-sci2017

Tuning electrical properties of silicon dioxide through intrinsic nano-patterns

Subimal Majee, Devesh Barshilia, Debashree Banerjee +3

The inherent network of nanopores and voids in silicon dioxide (SiO2) is generally undesirable for aspects of film quality, electrical insulation and dielectric performance. Howeve…

cond-mat.mtrl-sci2017

Signature of growth-deposition technique on the properties of PECVD and thermal SiO2

Subimal Majee, Devesh Barshilia, Sanjeev Kumar +2

In this article, we report the process induced variation in the characteristics of PECVD deposited and thermally grown silicon dioxide (SiO2) thin film. We find key differences in…

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