activity
20132021
most citedChemical mechanical polishing of thin film diamond

189 citations · 443 across the 7 of their papers we have counts for

collaborators

9 papers

physics.app-ph2021★ 41 cited

Microwave plasma modelling in clamshell chemical vapour deposition diamond reactors

Jerome A. Cuenca, Soumen Mandal, Evan L. H. Thomas +1

A microwave plasma model of a chemical vapour deposition (CVD) reactor is presented for understanding spatial heteroepitaxial growth of polycrystalline diamond on Si. This work is…

cond-mat.supr-con2021★ 13 cited

Contact resistance of various metallisation schemes to superconducting boron doped diamond between 1.9 and 300 K

Scott A. Manifold, Georgina Klemencic, Evan L. H. Thomas +4

Diamond is a material that offers potential in numerous device applications. In particular, highly boron doped diamond is attractive due to its superconductivity and high Young's M…

physics.app-ph2019

Thick adherent diamond films on AlN with low thermal barrier resistance

Soumen Mandal, Jerome Cuenca, Fabien Massabuau +9

Growth of 100 m thick diamond layer adherent on aluminium nitride is presented in this work. While thick films failed to adhere on untreated AlN films, hydrogen/nitrogen plas…

cond-mat.mtrl-sci2018

Superconducting Diamond on Silicon Nitride for Device Applications

Henry A. Bland, Evan L. H. Thomas, Georgina M. Klemencic +4

Chemical vapour deposition (CVD) grown nanocrystalline diamond is an attractive material for the fabrication of devices. For some device architectures, optimisation of its growth o…

physics.app-ph2018★ 12 cited

A simple, space constrained NIRIM type reactor for chemical vapour deposition of diamond

Evan L. H. Thomas, Laia Gines, Soumen Mandal +2

In this paper the design of a simple, space constrained chemical vapour deposition reactor for diamond growth is detailed. Based on the design by NIRIM, the reactor is composed of…

cond-mat.mtrl-sci2018★ 74 cited

Redox agent enhanced chemical mechanical polishing of thin film diamond

Soumen Mandal, Evan L. H. Thomas, Laia Gines +4

The chemical nature of the chemical mechanical polishing of diamond has been examined by adding various redox agents to the alkaline SF1 polishing slurry. Three oxidizing agents na…

cond-mat.mtrl-sci2017★ 43 cited

Surface zeta potential and diamond seeding on gallium nitride films

Soumen Mandal, Evan L. H. Thomas, Callum Middleton +9

Measurement of zeta potential of Ga and N-face gallium nitride has been carried out as function of pH. Both the faces show negative zeta potential in the pH range 5.5-9. The Ga fac…

cond-mat.mtrl-sci2014★ 71 cited

Polishing of {100} and {111} single crystal diamond through the use of Chemical Mechanical Polishing

Evan L. H. Thomas, Soumen Mandal, Emmanuel B. Brousseau +1

Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard Chemical Mechanica…

cond-mat.mtrl-sci2013★ 189 cited

Chemical mechanical polishing of thin film diamond

Evan L. H. Thomas, Geoffrey W. Nelson, Soumen Mandal +2

The demonstration that Nanocrystalline Diamond (NCD) can retain the superior Young's modulus (1,100 GPa) of single crystal diamond twinned with its ability to be grown at low tempe…