107 citations · 289 across the 9 of their papers we have counts for
10 papers
Thermoelectric properties and electronic structure of Cr(Mo,V)Nx thin films studied by synchrotron and lab-based X-ray spectroscopy
Susmita Chowdhury, Victor Hjort, Rui Shu +4
Chromium-based nitrides are used in hard, resilient coatings, and show promise for thermoelectric applications due to their combination of structural, thermal, and electronic prope…
Reflective, polarizing, and magnetically soft amorphous Fe/Si multilayer neutron optics with isotope-enriched 11B4C inducing atomically flat interfaces
A. Zubayer, N. Ghafoor, K. A. Thórarinsdóttir +11
The utilization of polarized neutrons is of great importance in scientific disciplines spanning materials science, physics, biology, and chemistry. Polarization analysis offers ins…
Influence of Si doping and O2-flow on arc deposited (Al,Cr)2O3 coatings
Ludvig Landälv, Emmanuelle Göthelid, Jens Jensen +6
(Al,Cr)2O3 coatings with Al/(Al+Cr) = 0.5 or Al = 70 at.%, doped with 0, 5 or 10 at.% Si, were deposited on hard metal and Si(100) substrates to elucidate the influence of Si on th…
Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmosphere
Martin Magnuson, Lina Tengdelius, Fredrik Eriksson +5
W-B-C films were deposited on Si(100) substrates held at elevated temperature by reactive sputtering from a W target in Kr/trimethylboron (TMB) plasmas. Quantitative analysis by X-…
Electronic excitation of transition metal nitrides by light ions with keV energies
Barbara Bruckner, Marcus Hans, Tomas Nyberg +3
We investigated the specific electronic energy deposition by protons and He ions with keV energies in different transition metal nitrides of technological interest. Data were obtai…
Compositional dependence of epitaxial Tin+1SiCn MAX-phase thin films grown from a Ti3SiC2 compound target
Martin Magnusona, Lina Tengdelius, Grzegorz Greczynski +7
We investigate sputtering of a Ti3SiC2 compound target at temperatures ranging from RT (no applied external heating) to 970 oC as well as the influence of the sputtering power at 8…