activity
19972023
most citedSwitching of magnetization by non-linear resonance studied in single nanoparticles

432 citations · 2.9k across the 44 of their papers we have counts for

collaborators

44 papers

cond-mat.mes-hall2023★ 48 cited

Observation of non-Hermitian topology in a multi-terminal quantum Hall device

Kyrylo Ochkan, Raghav Chaturvedi, Viktor Könye +10

Quantum devices characterized by non-Hermitian topology are predicted to show highly robust and potentially useful properties, but realizing them has remained a daunting experiment…

cond-mat.mes-hall2022★ 20 cited

Non-identical moiré twins in bilayer graphene

E. Arrighi, V. -H. Nguyen, M. Di Luca +8

The superlattice obtained by aligning a monolayer graphene and boron nitride (BN) inherits from the hexagonal lattice a sixty degrees periodicity with the layer alignment. It impli…

cond-mat.mes-hall2020★ 4 cited

Coulomb interactions and effective quantum inertia of charge carriers in a macroscopic conductor

A. Delgard, B. Chenaud, U. Gennser +4

We study the low frequency admittance of a quantum Hall bar of size much larger than the electronic coherence length. We find that this macroscopic conductor behaves as an ideal qu…

cond-mat.mes-hall2019★ 36 cited

Relaxation and revival of quasiparticles injected in an interacting quantum Hall liquid

R. H. Rodriguez, F. D. Parmentier, D. Ferraro +7

The one-dimensional, chiral edge channels of the quantum Hall effect are a promising platform in which to implement electron quantum optics experiments; however, Coulomb interactio…

cond-mat.str-el2019★ 82 cited

Chiral domain walls of MnSn and their memory

Xiaokang Li, Clément Collignon, Liangcai Xu +8

Magnetic domain walls are topological solitons whose internal structure is set by competing energies which sculpt them. In common ferromagnets, domain walls are known to be of eith…

physics.chem-ph2017★ 16 cited

A comparative study of resists and lithographic tools using the Lumped Parameter Model

Roberto Fallica, Robert Kirchner, Dominique Mailly +1

A comparison of the performance of high resolution lithographic tools is presented here. We use extreme ultraviolet interference lithography, electron beam lithography, and He ion…