activity
20032025
most citedSpatial structure of an individual Mn acceptor in GaAs

191 citations · 211 across the 7 of their papers we have counts for

collaborators
Showing physics.plasm-phShow all

5 papers · 1 filter

physics.plasm-ph2025

Transient population dynamics of nanoparticles during pulsed EUV exposures

M. Chaudhuri, L. C. J. Heijmans, A. M. Yakunin +3

The transient population dynamics of charged (postive or negative) and neutral nanoparticles have been investigated in a pulsed Extreme Ultra-Violet (EUV) exposure environment with…

physics.plasm-ph2024

Electromagnetic particle-in-cell modeling of an electron cyclotron resonance plasma discharge in hydrogen

D. Eremin, Yu. Sharova, L. Heijmans +4

A low pressure discharge sustained in molecular hydrogen with help of the electron cyclotron resonance heating at a frequency of 2.45 GHz is simulated using a fully electromagnetic…

physics.plasm-ph2021

EUV-induced Hydrogen Plasma : Pulsed Mode Operation and Confinement in Scanner

Mark van de Kerkhof, Andrei M. Yakunin, Dmitry Astakhov +3

In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…

physics.plasm-ph2020

Plasma-assisted Discharges and Charging in EUV-induced Plasma

Mark van de Kerkhof, Andrei M. Yakunin, Vladimir Kvon +4

In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…

physics.plasm-ph20201 cited

Particle lofting from substrate exposed to plasma and electron beam

P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4

A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from…