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cond-mat.mes-hall2003
A Low-Temperature Atomic Layer Deposition Liftoff Method for Microelectronic and Nanoelectronic Applications
M. J. Biercuk, D. J. Monsma, C. M. Marcus +2
We report a novel method for depositing patterned dielectric layers with sub-micron features using atomic layer deposition (ALD). The patterned films are superior to sputtered or e…
cond-mat.mes-hall2003
Current-Induced Magnetization Reversal in High Magnetic Fields in Co/Cu/Co Nanopillars
B. Oezyilmaz, A. D. Kent, D. Monsma +3
Current-induced magnetization dynamics in Co/Cu/Co trilayer nanopillars (~100nm in diameter) has been studied experimentally for large applied fields perpendicular to the layers. A…