27 citations · 83 across the 8 of their papers we have counts for
3 papers · 1 filter
Shape relaxation of epitaxial mesa for finite-size strain-engineering
Kennet D. R. Hannikainen, Luc Favre, Fabien Deprat +3
Silicon-Germanium (SiGe) layers are commonly used as stressors in the gate of MOSFET devices. They are expected to introduce a beneficial stress in the drift and channe…
Van der Waals heteroepitaxy of air stable quasi-free standing silicene layers on CVD epitaxial graphene/6H-SiC
Zouhour Ben Jabra, Mathieu Abel, Filippo Fabbri +8
Graphene, consisting of an inert, thermally stable material with an atomically flat, dangling bond-free surface is by essence an ideal template layer for van der Waals heteroepitax…
Self-organized Kagome-lattice in a metal-organic monolayer
Nesrine Shaiek, Hassan Denawi, Mathieu Koudia +7
We report on the successful on-surface synthesis of metal-organic covalent coordination networks with a dense Kagome lattice of metallic centers. In the case of Mn centers ab-initi…