activity
20142024
most citedA physical model for the reverse leakage current in (In,Ga)N/GaN light-emitting diodes based on nanowires

41 citations · 144 across the 7 of their papers we have counts for

collaborators

7 papers

cond-mat.mtrl-sci2024★ 40 cited

High-temperature growth of GaN nanowires by molecular beam epitaxy: toward the materials quality of bulk GaN

J. K. Zettler, C. Hauswald, P. Corfdir +5

In molecular beam epitaxy, the spontaneous formation of GaN nanowires on Si(111) substrates at elevated temperatures is limited by the long incubation time that precedes nanowire n…

physics.app-ph2019★ 10 cited

Electroluminescence and current-voltage measurements of single (In,Ga)N/GaN nanowire light-emitting diodes in the nanowire ensemble

David van Treeck, Johannes Ledig, Gregor Scholz +7

We present the combined analysis of the electroluminescence (EL) as well as the current-voltage (I-V) behavior of single, freestanding (In,Ga)N/GaN nanowire (NW) light-emitting dio…

cond-mat.mes-hall2017

The effect of the three-dimensional strain variation on the emission properties of light-emitting diodes based on (In,Ga)N/GaN nanowires

M. Musolino, F. Sacconi, A. Tahraoui +5

In the experimental electroluminescence (EL) spectra of light-emitting diodes (LEDs) based on N-polar (In,Ga)N/GaN nanowires (NWs), we observed a double peak structure. The relativ…

cond-mat.mtrl-sci2016★ 2 cited

Hydride Vapor Phase Epitaxy of GaN on Silicon Covered by Nanostructures

U. Jahn, M. Musolino, J. Lähnemann +8

Several ten m GaN have been deposited on a silicon substrate using a two-step hydride vapor phase epitaxy (HVPE) process. The substrates have been covered by AlN layers and GaN…

cond-mat.mes-hall2015★ 41 cited

A physical model for the reverse leakage current in (In,Ga)N/GaN light-emitting diodes based on nanowires

M. Musolino, D. van Treeck, A. Tahraoui +6

We investigated the origin of the high reverse leakage current in light emitting diodes (LEDs) based on (In,Ga)N/GaN nanowire (NW) ensembles grown by molecular beam epitaxy on Si s…

cond-mat.mtrl-sci2014★ 32 cited

Compatibility of the selective area growth of GaN nanowires on AlN-buffered Si substrates with the operation of light emitting diodes

Mattia Musolino, Abbes Tahraoui, Sergio Fernández-Garrido +4

AlN layers with thicknesses between 2 and 14 nm were grown on Si(111) substrates by molecular beam epitaxy. The effect of the AlN layer thickness on the morphology and nucleation t…

cond-mat.mtrl-sci2014★ 19 cited

Understanding peculiarities in the optoelectronic characteristics of light emitting diodes based on (In,Ga)N/GaN nanowires

Mattia Musolino, Abbes Tahraoui, Friederich Limbach +5

We investigate the effect of the p-type top contact on the optoelectronic characteristics of light emitting diodes (LEDs) based on (In,Ga)N/GaN nanowire (NW) ensembles grown by mol…