102 citations · 908 across the 35 of their papers we have counts for
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physics.plasm-ph2026
A Nonlinear Two-Sheath Circuit Model for Low-Pressure Symmetric and Asymmetric Capacitively Coupled Radio-Frequency Plasmas
Katharina Noesges, Tim Bolles, Máté Vass +2
We develop a nonlinear self-consistent two-sheath circuit model for low-pressure capacitively coupled plasmas that applies to geometrically symmetric as well as asymmetric discharg…
physics.plasm-ph2026
Non-invasive monitoring of process-relevant plasma parameters by Fiber PROES in capacitively coupled Ar/CF plasmas
Florian Beckfeld, Maximilian Ryppa, Constantin Neuroth +3
Monitoring changes of process-relevant plasma parameters, such as the electron density and ion flux to the wafer, is essential for the development and control of plasma processes.…