24 citations · 24 across the 2 of their papers we have counts for
2 papers
cond-mat.mtrl-sci2024
Low-temperature fabrication of amorphous carbon films as a universal template for remote epitaxy
T. Henksmeier, P. Mahler, A. Wolff +7
We report on the low-temperature fabrication (300C) of ultrathin 2D amorphous carbon layers on III-V semiconductors by plasma-enhanced chemical vapor deposition as a universal t…
cond-mat.mes-hall2016★ 24 cited
Plasma-enhanced chemical vapor deposition of amorphous Si on graphene
G. Lupina, C. Strobel, J. Dabrowski +8
Plasma-enhanced chemical vapor deposition of thin a-Si:H layers on transferred large area graphene is investigated. Radio frequency (RF, 13.56 MHz) and very high frequency (VHF, 14…