93 citations · 95 across the 3 of their papers we have counts for
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cs.AR2014★ 93 cited
Layout decomposition for triple patterning lithography
Bei Yu, Kun Yuan, Boyang Zhang +2
As minimum feature size and pitch spacing further decrease, triple patterning lithography (TPL) is a possible 193nm extension along the paradigm of double patterning lithography (D…
cs.AR2014★ 2 cited
E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System
Bei Yu, Kun Yuan, Jhih-Rong Gao +1
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, recently the traditional EBL syst…