76 citations · 162 across the 6 of their papers we have counts for
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Spatially-Modulated Silicon Interface Energetics via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina
Alex Henning, Johannes D. Bartl, Lukas Wolz +12
Atomic layer deposition (ALD) is a key technique for the continued scaling of semiconductor devices, which increasingly relies on reproducible and scalable processes for interface…
Surface NMR using quantum sensors in diamond
Kristina S. Liu, Alex Henning, Markus W. Heindl +5
Characterization of the molecular properties of surfaces under ambient or chemically reactive conditions is a fundamental scientific challenge. Moreover, many traditional analytica…
Aluminum Oxide at the Monolayer Limit via Oxidant-free Plasma-Assisted Atomic Layer Deposition on GaN
Alex Henning, Johannes D. Bartl, Andreas Zeidler +7
Atomic layer deposition (ALD) is an essential tool in semiconductor device fabrication that allows the growth of ultrathin and conformal films to precisely form heterostructures an…