2 papers
cond-mat.mtrl-sci2021
Aluminum Oxide at the Monolayer Limit via Oxidant-free Plasma-Assisted Atomic Layer Deposition on GaN
Alex Henning, Johannes D. Bartl, Andreas Zeidler +7
Atomic layer deposition (ALD) is an essential tool in semiconductor device fabrication that allows the growth of ultrathin and conformal films to precisely form heterostructures an…
cond-mat.mes-hall2015
Linear and Non-linear Response of Lithographically Defined Plasmonic Nanoantennas
K. Schraml, M. Kaniber, J. Bartl +4
We present numerical studies, nano-fabrication and optical characterization of bowtie nanoantennas demonstrating their superior performance with respect to the electric field enhan…