97 citations · 268 across the 17 of their papers we have counts for
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Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
Roberto Fallica, Dimitrios Kazazis, Robert Kirchner +4
Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist materi…
Magnetic-field driven ambipolar quantum Hall effect in epitaxial graphene close to the charge neutrality point
A. Nachawaty, M. Yang, W. Desrat +7
We have investigated the disorder of epitaxial graphene close to the charge neutrality point (CNP) by various methods: i) at room temperature, by analyzing the dependence of the re…
Nonmonotonous classical magneto-conductivity of a two-dimensional electron gas in a disordered array of obstacles
N. H. Siboni, J. Schluck, K. Pierz +4
Magnetotransport measurements in combination with molecular dynamics (MD) simulations on two-dimensional disordered Lorentz gases in the classical regime are reported. In quantitat…