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cond-mat.mtrl-sci2025
Breakdown characteristics of SiNx with different stoichiometries for resistive memories
A. E. Mavropoulis, I. Kanellopoulos, G. Pissanos +6
The breakdown characteristics of SiNx layers with different stoichiometries are explored. The stoichiometry of SiNx is modified by changing the gas flow rates during the LPCVD depo…
cond-mat.mtrl-sci2025
SiNx RRAMs performance with different stoichiometries
A. E. Mavropoulis, G. Pissanos, N. Vasileiadis +3
The microstructure of SiNx is strongly affected by its stoichiometry, x. The stoichiometry of SiNx thin films can be modified by adjusting the gas flow rates during LPCVD depositio…
cond-mat.mtrl-sci2025
Silicon nitride resistance switching MIS cells doped with silicon atoms
A Mavropoulis, N Vasileiadis, C Bonafos +4
Stoichiometric SiNx layers (x = [N]/[Si] = 1.33) are doped with Si atoms by ultra-low energy ion implantation (ULE-II) and subsequently annealed at different temperatures in inert…