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physics.app-ph2020
Indium-Tin-Oxide Transistors with One Nanometer Thick Channel and Ferroelectric Gating
Mengwei Si, Joseph Andler, Xiao Lyu +4
In this work, we demonstrate high performance indium-tin-oxide (ITO) transistors with the channel thickness down to 1 nm and ferroelectric Hf0.5Zr0.5O2 as gate dielectric. On-curre…
physics.app-ph2020
-InSe based Ferroelectric-Semiconductor Metal Junction for Non-Volatile Memories
Atanu K. Saha, Mengwei Si, Peide Ye +1
In this work, we theoretically and experimentally investigate the working principle and non-volatile memory (NVM) functionality of 2D -InSe based ferroelectric-semicondu…