collaborators

1 paper

cs.OH2014

Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session)

Bei Yu, Subhendu Roy, Jhih-Rong Gao +1

Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. Conventional LELELE type TPL technology suffers from native conflict…